Title:
EUV光源測定のためのシステム及び方法
Document Type and Number:
Japanese Patent JP4913808
Kind Code:
B2
Abstract:
Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi2/Si multi-layer mirror.
Inventors:
Formen Coff Igo Vie
Beauverink Norbert El
Hoffman Jersey Earl
Beauverink Norbert El
Hoffman Jersey Earl
Application Number:
JP2008520314A
Publication Date:
April 11, 2012
Filing Date:
June 29, 2006
Export Citation:
Assignee:
Cymer Incorporated
International Classes:
G01J1/02; G01J1/00; G01J1/04; H01L21/027; H05G2/00; H01J37/073; H01J37/244
Domestic Patent References:
| JP2003518316A | 2003-06-03 | |||
| JP2001215721A | 2001-08-10 | |||
| JP2006520107A | 2006-08-31 | |||
| JPH10255709A | 1998-09-25 | |||
| JP2005064135A | 2005-03-10 |
Foreign References:
| DE10244303A1 | 2004-04-01 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda