Title:
TARGET IN SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JPH0544028
Kind Code:
A
Abstract:
PURPOSE: To optimize the interval between a target and a sample and the geometric shape of the surface of the target in a short period of time when a sputtering device is designed, produced and evaluated.
CONSTITUTION: When the interval between a target 1 and a sample 2 and the geometric shape of the surface of the target 1 are determined with the target 1 for evaluation at the time of sputtering, the interval between the target 1 and the sample 2 is varied by making the target 1 rugged in the same plane or the geometric shape of the surface of the target 1 is varied in the same plane.
Inventors:
FUJINUMA AKIRA
Application Number:
JP20103891A
Publication Date:
February 23, 1993
Filing Date:
August 12, 1991
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
C23C14/34; C30B25/06; H01L21/285; H01L21/31; H05H1/34; (IPC1-7): C23C14/34; C30B25/06; H01L21/285; H01L21/31; H05H1/34
Attorney, Agent or Firm:
Teiichi