To produce a target for sputtering in which the generation of pinholes frequently occuring in sputtering in the initial stage of exchanging the target in particular is suppressed, and to provide a method for producing a black matrix for a color filter using the same.

In a target having an erosion region 13 and non-erosion regions 11 and 12 in the surface, and the non-erosion regions 11 and 12 are present respectively at the center part and outer circumferential part of the target surface, at least the target material in the non-erosion region 11 at the center part has been removed. By using this target, a black matrix can be produced on a substrate by sputtering.