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Title:
TEMPLATE AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2016225370
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a template which prevents a resist from exuding from a pattern formation surface of the template to an outer periphery part of the template during imprint processing.SOLUTION: A template, in which an uneven pattern is formed on one major surface of a template substrate 10, is provided. The template includes a liquid-repellent pattern 32, which is liquid-repellent against a resist, along a periphery of a pattern arrangement area in which the uneven pattern is disposed.SELECTED DRAWING: Figure 3

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Inventors:
KAWAMURA YOSHIHISA
HATANO MASAYUKI
KOMATSU YOKO
KASHIWAGI HIROYUKI
Application Number:
JP2015107823A
Publication Date:
December 28, 2016
Filing Date:
May 27, 2015
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
H01L21/027; B29C33/42; B29C59/02
Domestic Patent References:
JP2014160754A2014-09-04
JP2011521438A2011-07-21
JP2016157785A2016-09-01
JP2008091782A2008-04-17
JP2013214627A2013-10-17
JP2010251601A2010-11-04
Foreign References:
US20080303187A12008-12-11
US20160247673A12016-08-25
US20090200710A12009-08-13
US20080090170A12008-04-17
US20100264113A12010-10-21
Attorney, Agent or Firm:
Sakai International Patent Office



 
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