Title:
Terminal point determination of focused ion beam processing
Document Type and Number:
Japanese Patent JP6113842
Kind Code:
B2
Abstract:
To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a predetermined criterion is met.
Inventors:
Scott Edward Fuller
Jason Donald
Thermsapto Simunchai Born
Jason Donald
Thermsapto Simunchai Born
Application Number:
JP2015523053A
Publication Date:
April 12, 2017
Filing Date:
July 16, 2012
Export Citation:
Assignee:
F-I-I Company
International Classes:
H01J37/305; H01J37/22; H01J37/317
Domestic Patent References:
| JP11273613A | ||||
| JP4062748A | ||||
| JP6160067A | ||||
| JP2005317330A | ||||
| JP2010507782A |
Foreign References:
| US20120112063 | ||||
| US7732765 |
Attorney, Agent or Firm:
Masahiko Amagai