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Title:
TETRAKISAZO COMPOUND AND RECORDING LIQUID CONTAINING THE COMPOUND
Document Type and Number:
Japanese Patent JPH08302220
Kind Code:
A
Abstract:

PURPOSE: To obtain the subject new compound of a specific structure, having modified ejection stability, ejection responsiveness, storage stability in a solution, etc., excellent in the sharpness of recording image, heat resistance, water resistance and light resistance and useful for an ink jet printer.

CONSTITUTION: A free acid compound expressed by formula I [Q1 and Q2 are each a (substituted) phenylene or naphthylene; R4 to R6 are each H, hydroxy, hydroxyethylsulfonyl, sulfo, a halogen, a (substituted) amino, etc.; R7 and R8 are each H, hydroxy, hydroxyethylsulfonyl, a halogen, a (substituted) alkyl, an alkoxy, etc.]. This compound is preferably a free acid of formula II [R1 to R3 are each H, carboxy, hydroxyethylsulfonyl, a halogen, a (substituted) amino, etc.]. Further, the compound is preferably obtained e.g. by diazotizing a trisazo compound of formula III and subjecting the obtained diazo compound to coupling reaction with a compound of formula IV (e.g. 1-hydroxy-3- aminobenzene) in an aqueous weakly acidic to weakly basic medium.


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Inventors:
YAMAZAKI TOMOJI
KAWASHITA HIDEO
NISHIDA YUUJI
KOJIMA EIKO
OGINO KAZUYA
TAMURA YURIKO
Application Number:
JP12923595A
Publication Date:
November 19, 1996
Filing Date:
April 28, 1995
Export Citation:
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Assignee:
TAOKA CHEMICAL CO LTD
SUMITOMO CHEMICAL CO
International Classes:
C09B35/04; C09D11/00; (IPC1-7): C09B35/04; C09D11/00