Title:
テクスチャー形成用組成物
Document Type and Number:
Japanese Patent JP5484249
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a texture formation composition for forming a silicon substrate low in reflectance, the silicon substrate having fine recesses and protrusions which are free from variations and formed on a surface of the silicon substrate, and a method for forming the texture.SOLUTION: There are provided: a texture formation composition that is brought into contact with a silicon substrate surface to form recesses and protrusions on the silicon substrate surface; and a method in which the texture formation composition is brought into contact with the silicon substrate surface to form the recesses and protrusions on the silicon substrate surface. The texture formation composition includes water, a base and an amino alcohol.
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Inventors:
Osamu Yatabe
Murako Akiko
Murako Akiko
Application Number:
JP2010175876A
Publication Date:
May 07, 2014
Filing Date:
August 05, 2010
Export Citation:
Assignee:
Tokuyama Corporation
International Classes:
H01L21/308; H01L21/306; H01L31/04
Domestic Patent References:
| JP2010074102A | ||||
| JP2005537680A | ||||
| JP2011139023A |
Foreign References:
| WO2010050338A1 |