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Title:
THERMOSETTING RESIN COMPOSITION FOR LIGHT REFLECTION, PHOTOSEMICONDUCTOR ELEMENT-LOADING SUBSTRATE USING THE SAME, PHOTOSEMICONDUCTOR DEVICE, AND MANUFACTURING PROCESS FOR THE ARTICLES
Document Type and Number:
Japanese Patent JP2008144127
Kind Code:
A
Abstract:

To provide a thermosetting resin composition for light reflection having high reflectance of from visible light to near ultraviolet light after curing, excellent heat deterioration resistance and tablet moldability as well as less molding flash upon transfer molding, and to provide a photosemiconductor element-loading substrate using the resin composition, a photosemiconductor device and manufacturing processes for the articles.

This thermosetting resin composition comprises (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, (D) an inorganic filler, (E) a white pigment, and (F) a coupling agent. When a transfer molding using the resin composition is performed under a condition in which a molding temperature is 100-200C, molding pressure is 20 MPa, and a molding period of time is 60-120 seconds, a length of the molding flash is 5 mm, as well as the light reflectance at a wavelength of 350-800 nm after curing is 80%. The photosemiconductor element-loading substrate using the resin composition, the photosemiconductor device and these manufacturing processes are also disclosed.


Inventors:
KOTANI ISATO
URASAKI NAOYUKI
YUASA KANAKO
NAGAI AKIRA
HAMADA MITSUYOSHI
Application Number:
JP2007114227A
Publication Date:
June 26, 2008
Filing Date:
April 24, 2007
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08L63/00; C08J3/20; C08K3/00; C08K5/54; H01L33/50; H01L33/56; H01L33/60; H01L33/62
Domestic Patent References:
JPH06209024A1994-07-26
JP2006140207A2006-06-01
JPH0459863A1992-02-26
JP2001118969A2001-04-27
JP2001158614A2001-06-12
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu