To provide a thin film deposition system capable of reducing a film deposition defect caused by splashes, to provide a thin film deposition method, to provide a method for producing an electro-optic apparatus, and to provide an electronic unit.
Regarding the thin film deposition system 100 where a film material M stored in a hearth 104 as an evaporation source provided at the inside of a chamber 101 is irradiated with a plasma beam PB, and is heated, so as to be evaporated, thus a thin film is deposited on a substrate W, the system comprises: a plasma beam generator 110 generating the plasma beam PB; a substrate mounting part 121 supporting the substrate W so as to be confronted with the hearth 104; an electrically conductive capturing plate 130 provided between the substrate mounting part 121 and the hearth 104 and having a plurality of opening parts; and a potential generating part V4 giving a positive or negative potential to the capturing board 130.
Fujitsuna Hideyoshi
Kazuhiko Miyasaka
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