Title:
THIN FILM FORMING DEVICE
Document Type and Number:
Japanese Patent JPS60247916
Kind Code:
A
Abstract:
PURPOSE:To control the mixed crystal ratio of a mixed crystal thin film to the desired value, and moreover with high precision at real time by a method wherein the set value of the desired mixed crystal ratio, and a measured value sent from a mixed crystal ratio measuring instrument are compared, and the mixed crystal ratio is so controlled as to make the difference to the minimum. CONSTITUTION:The value of the desired mixed crystal ratio is applied to a mixed crystal ratio comparing and controlling instrument 18, and shutters 7a, 7b are opened to start formation of a mixed crystal thin film. A mixed crystal ratio measuring instrument 17 measures the mixed crystal ratio of the mixed crystal thin film on a substrate 2, and the measured value thereof is sent to the controller 18 and a mixed crystal thin film film-thickness measuring instrument 20. The controller 18 compares the value thereof with the value of previously set desired mixed crystal ratio, and a command is sent to a crucible heating control electric power surce 19 as to make the difference thereof to become to the minimum.
Inventors:
ETSUCHIYUU MASAO
FUJII HARUHISA
SHIBUYA GIICHI
FUJII HARUHISA
SHIBUYA GIICHI
Application Number:
JP10493684A
Publication Date:
December 07, 1985
Filing Date:
May 22, 1984
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/268; C23C14/54; H01L21/203; (IPC1-7): H01L21/203; H01L21/26
Attorney, Agent or Firm:
Masuo Oiwa