PURPOSE: To provide a thin film forming substrate holder capable of keeping the temp. distribution of a substrate uniform over a wide range and capable of eliminating the adverse effect of the thermal distortion of the holder in the formation of a thin film using sputtering, laser beam abrasion, vacuum deposition, ion plating, etc.

CONSTITUTION: The peripheral edge of a substrate 8 is placed on an annular step 7 formed on the upper face of a substrate holder 1 and fixed to the holder 1 with a mounting jig 3. When the holder 1 is heated by a heater 6, the substrate 1 is widely and uniformly heated by the heat radiated from the holder 1. As a result, the characteristic of the thin film formed on the substrate 8 is uniformized over a wide range.