Title:
薄膜製造方法、薄膜製造装置
Document Type and Number:
Japanese Patent JP5875851
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a technology for cleaning a thin film deposited on a mask when depositing a film on a substrate, thereby regenerating the mask.SOLUTION: A method for depositing a thin film comprises: placing a discharging apparatus 24 inside a vacuum tank 21 and releasing an organic material vapor from the discharging apparatus 24, thereby forming a sacrifice layer on a surface of a mask body to compose the mask; placing the substrate on the mask and discharging a vapor of a thin film material from the discharging apparatus 24, thereby forming a patterned thin film on the substrate surface, provided that the thin film is also formed on the surface of the mask; irradiating the mask with a laser beam from a laser beam irradiating apparatus 25 placed inside the vacuum tank 21, thereby evaporating the sacrifice layer and separating the thin film deposited at the surface of the sacrifice layer from the mask body; forming a new sacrifice layer on the surface of the mask body; and using the mask body for depositing a thin film on the substrate surface. This method enables both thin film deposition and mask regeneration within the same vacuum tank.
Inventors:
Yang Yang
Application Number:
JP2011278823A
Publication Date:
March 02, 2016
Filing Date:
December 20, 2011
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/24; C23C14/00; H01L51/50; H05B33/10
Domestic Patent References:
| JP2002241925A | ||||
| JP2004300495A | ||||
| JP10053857A | ||||
| JP7145472A | ||||
| JP2002060926A | ||||
| JP2006063446A | ||||
| JP2003313654A | ||||
| JP2008088483A |
Foreign References:
| US20020011205 | ||||
| US20060110904 | ||||
| US20080081115 |
Attorney, Agent or Firm:
Shigeo Ishijima
Hideki Abe
Hideki Abe