Title:
チオール化合物、その合成方法および該チオール化合物の利用
Document Type and Number:
Japanese Patent JP7106426
Kind Code:
B2
Abstract:
To provide a novel thiol compound, a method for the synthesis of the compound, a curing agent containing the compound, a resin composition containing the compound and an epoxy compound, a resin composition containing the compound and an ene compound having a carbon-carbon double bond in the molecule, and an adhesive and a sealant containing the resin composition as a component.SOLUTION: The present invention provides a thiol compound illustrated by the following formulae.SELECTED DRAWING: None
Inventors:
Naoto Okumura
Akihito Otsuka
Takeshi Kumano
Kazuyuki Fujikawa
Yusuke Araki
Akihito Otsuka
Takeshi Kumano
Kazuyuki Fujikawa
Yusuke Araki
Application Number:
JP2018201514A
Publication Date:
July 26, 2022
Filing Date:
October 26, 2018
Export Citation:
Assignee:
Shikoku Chemical Industry Co., Ltd.
International Classes:
C07C321/22; C07C319/18; C08G59/60; C08G59/66; C08G75/045; C08K5/37; C08L63/00; C09J4/00; C09J11/06; C09J163/00; C09K3/10
Domestic Patent References:
JP2016066605A | ||||
JP2014058667A | ||||
JP6211969A | ||||
JP6211970A | ||||
JP2009520058A | ||||
JP2014510168A |
Foreign References:
WO2003081295A1 | ||||
WO2019082962A1 |
Other References:
CAS Registry No. 639079-39-3,Database REGISTRY [online], Retrieved from: STN International,Entered STN,2004年01月19日
Previous Patent: Thiol compound, its synthesis method and utilization of the thiol compound
Next Patent: FABRICATION OF CMOS SEMICONDUCTOR DEVICE
Next Patent: FABRICATION OF CMOS SEMICONDUCTOR DEVICE