Title:
THIOL RESIN AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THIOL RESIN
Document Type and Number:
Japanese Patent JP2021031625
Kind Code:
A
Abstract:
To provide a thiol resin (A) capable of achieving developability, dispersibility of a colorant, solvent resistance of a cured film, and a high elastic recovery rate, and a photosensitive resin composition.SOLUTION: The thiol resin (A) contains a mercapto group and a carboxy group and is obtained by adding a polybasic acid anhydride (a-3) to an addition reaction product (M) of a polyfunctional thiol compound (a-1) including at least three mercapto groups and a polyfunctional compound (a-2) having at least two reactive groups (RG) having reactivity with a mercapto group. The addition reaction product (M) is an addition reaction product of the mercapto group of the polyfunctional thiol compound (a-1) and the reactive group (RG) of the polyfunctional compound (a-2). The ratio of the total molar number of the reaction groups (RG) in the compound (a-2) with respect to the total molar number of the mercapto groups in the compound (a-1) is 0.20 to 0.60.SELECTED DRAWING: None
Inventors:
YANAGI MASAYOSHI
KINOSHITA TAKEHIRO
KINOSHITA TAKEHIRO
Application Number:
JP2019154958A
Publication Date:
March 01, 2021
Filing Date:
August 27, 2019
Export Citation:
Assignee:
SHOWA DENKO KK
International Classes:
C08G18/38; C08G59/14; C08G75/04; G02B5/20; G03F7/004; G03F7/027
Attorney, Agent or Firm:
Shu Oikawa
Norihiko Ara
Tomoo Katsumata
Norihiko Ara
Tomoo Katsumata