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Title:
TITANIUM-EVAPORATION-TYPE VACUUM DEVICE FOR PRODUCING PLASMA
Document Type and Number:
Japanese Patent JPS601386
Kind Code:
A
Abstract:

PURPOSE: To increase the speed of gas evacuation, by providing a shielding plate in a titanium evaporator to keep titanium from clinging to all the inside of a vacuum vessel, and by making the surface of the shielding plate so rough as to have numerous projections and recesses.

CONSTITUTION: Titanium 4 vaporized from the tip 3a of a chip evaporator 3 clings to the inside of a vacuum vessel, with which plasma P does not come into contact. Therefore, the clinging titanium 4 and the plasma P do not interact with each other. Because of the adsorbing action of the clinging titanium, the whole interior of the vacuum vessel 1 is put in a high degree of vacuum. Since the surface of a shielding plate 5 is provided with projections and recesses, the surface area of the plate 5 is increased to heighten the speed of gas evacuation.


Inventors:
YAMAGUCHI SAKUTAROU
MIYAMOTO KAZUHIRO
Application Number:
JP10958183A
Publication Date:
January 07, 1985
Filing Date:
June 16, 1983
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
B01J3/00; B01J19/08; F04B37/02; G21B1/11; G21B1/17; (IPC1-7): F04B37/02; B01J3/03; G21B1/00
Attorney, Agent or Firm:
Masuo Oiwa