Title:
【発明の名称】抗微生物性ポリマー材料
Document Type and Number:
Japanese Patent JP3012321
Kind Code:
B2
Abstract:
Polyamide, polyurea, polyhydrazide, and polyurethane materials having substantially modified surfaces which are antimicrobial are disclosed. The disclosure also relates to selective ultraviolet (UV) photon irradiation, high energy electron irradiation low energy electron irradiation and chemical reducing processes for preparing such antimicrobial, polymeric materials. The disclosure further provides methods for controlling microorganisms, and products made from the antimicrobial, polymeric materials of this invention.
Inventors:
Cohen, The Free Day
Aken Brecker, Curl, Giunia
Haney, Sharon El
Kelly, Michael Jiyoung
Henry, Kobusa
Rho, Arthur Nicholas
Syora, Michael H
Aken Brecker, Curl, Giunia
Haney, Sharon El
Kelly, Michael Jiyoung
Henry, Kobusa
Rho, Arthur Nicholas
Syora, Michael H
Application Number:
JP51571990A
Publication Date:
February 21, 2000
Filing Date:
November 05, 1990
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
A61L15/16; A61L15/26; A61L15/44; A61L27/18; A61L29/00; A61L29/06; A23L3/3526; A61L31/00; B29C59/16; C08J7/00; C08J7/12; D06M10/00; B29C35/08; D06M101/00; D06M101/02; D06M101/10; D06M101/12; D06M101/16; D06M101/30; D06M101/34; D06M101/38; (IPC1-7): C08J7/00; A61L15/16; A61L31/00; C08G18/00; C08J3/28; D06M10/00
Domestic Patent References:
| JP63152473A | ||||
| JP63152474A |
Attorney, Agent or Firm:
Heiyoshi Odashima (1 person outside)