Title:
【発明の名称】超格子物質を作成するための化学蒸着プロセス
Document Type and Number:
Japanese Patent JPH09504500
Kind Code:
A
Abstract:
A substrate is prebaked in an oxygen furnace. A thin film of layered superlattice oxide is formed on the substrate by a chemical vapor deposition process. The film is RTP baked to provide grains with a mixed phase of A-axis and C-axis orientation. The film may be treated by ion implantation prior to the RTP bake and oxygen furnace annealed after the RTP bake. An electrode is deposited on the layered superlattice thin film and then the film and electrode are oxygen furnace annealed.
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Inventors:
Paz de Arojo, Carlos A.
Watanabe Hitoshi
Scott, Michael Sea.
Takashi Mihara
Watanabe Hitoshi
Scott, Michael Sea.
Takashi Mihara
Application Number:
JP50458695A
Publication Date:
May 06, 1997
Filing Date:
June 30, 1994
Export Citation:
Assignee:
Symmetrics Corporation
Olympus Optical Co., Ltd.
Olympus Optical Co., Ltd.
International Classes:
C30B29/10; C23C16/02; C23C16/40; C23C16/56; C23C18/12; C30B7/00; C30B25/02; C30B29/68; C30B31/22; C30B33/02; H01C7/10; H01L21/02; H01L21/314; H01L21/316; H01L21/822; H01L21/8242; H01L21/8247; H01L27/04; H01L27/108; H01L27/115; H01L29/788; H01L29/792; (IPC1-7): C30B29/68; C23C16/56; C30B29/10; C30B31/22; C30B33/02; H01L21/314; H01L21/316; H01L21/822; H01L21/8242; H01L21/8247; H01L27/04; H01L27/108; H01L29/788; H01L29/792
Attorney, Agent or Firm:
Takashi Ishida (3 others)