Title:
【発明の名称】化学増幅ポジ型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP3360267
Kind Code:
B2
Abstract:
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C-O-C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡ C-COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
Inventors:
Satoshi Watanabe
Osamu Watanabe
降▲旗▼ 智欣
Yoshifumi Takeda
Shigehiro Nagura
Toshinobu Ishihara
Ao Yamaoka
Osamu Watanabe
降▲旗▼ 智欣
Yoshifumi Takeda
Shigehiro Nagura
Toshinobu Ishihara
Ao Yamaoka
Application Number:
JP11039597A
Publication Date:
December 24, 2002
Filing Date:
April 11, 1997
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C08F8/00; C08F112/14; C08K5/13; C08K5/17; C08K5/34; C08K5/42; C08L25/18; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F8/00; C08F112/14; C08K5/13; C08K5/17; C08K5/34; C08K5/42; C08L25/18; H01L21/027
Domestic Patent References:
| JP8253534A | ||||
| JP8305025A | ||||
| JP5181279A | ||||
| JP815864A | ||||
| JP792679A | ||||
| JP8262721A | ||||
| JP8160622A | ||||
| JP7333834A | ||||
| JP7319163A | ||||
| JP1020504A |
Attorney, Agent or Firm:
Takashi Kojima