Title:
【発明の名称】シリコンウエハ熱処理用組合せ治具とその製造方法
Document Type and Number:
Japanese Patent JP2802234
Kind Code:
B2
Abstract:
PURPOSE: To prevent a silicon wafer from being contaminated by a method wherein a jig for mounting of the silicon wafer and a support jig are constituted of quartz glass and both are combined via a silicon member. CONSTITUTION: Silicon wafers 2 are inserted into wafer insertion grooves in a cassette boat 1 which is constituted of quartz glass and which is a jig for mounting of the silicon wafers. This assembly is set on a motherboard 5 in which a silicon plate 6 is coupled by a coupling pin 4 and which is a support jig constituted of quartz glass. This assembly is brought into a core tube 7 for an electric furnace which is provided with a liner tube 8 and the core tube 7, and the oxidation treatment of the silicon wafers 2 is executed. Then, the contamination of the silicon wafers 2, especially the contamination due to the movement of sodium element, is prevented effectively, and the silicon wafers 2 in which uniform and good-quality oxide films have been formed are obtained.
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Inventors:
Katsuhiko Kenmochi
Application Number:
JP22896894A
Publication Date:
September 24, 1998
Filing Date:
August 31, 1994
Export Citation:
Assignee:
Shin-Etsu Quartz Products Co., Ltd.
International Classes:
C03C3/06; H01L21/22; H01L21/322; H01L21/324; H01L21/68; H01L21/683; (IPC1-7): H01L21/22; C03C3/06; H01L21/322; H01L21/324; H01L21/68
Domestic Patent References:
| JP5599718A | ||||
| JP5568621A | ||||
| JP58165319A | ||||
| JP5851508A | ||||
| JP61289289A | ||||
| JP63215600A |
Attorney, Agent or Firm:
Heihachi Hattori