Title:
CHARGED-PARTICLE-APPLYING ANALYZER AND CHARGED-PARTICLE-APPLYING PLOTTER
Document Type and Number:
Japanese Patent JPH0745227
Kind Code:
A
Abstract:
PURPOSE: To provide a scanning electron microscope(SEM) by which an image of a recess and projection pattern on a surface of a sample can be displayed clearly by preventing accumulation of an electron beam (incident electric charge). on the surface of the sample (semiconductor substrate).
CONSTITUTION: A vacuum vessel 31 added outside of a vacuum tank 2 in which a sample 1 is arranged so as to generate plasma 38, is provided. Incident electric charge is neutralized by the plasma 38 on a surface of the sample 1 to be analyzed by radiation of an electron beam 3a.
Inventors:
NAKAO SHUJI
Application Number:
JP14057793A
Publication Date:
February 14, 1995
Filing Date:
June 11, 1993
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
C23C14/48; H01J27/16; H01J37/08; H01L21/027; (IPC1-7): H01J37/08; C23C14/48; H01J27/16; H01L21/027
Domestic Patent References:
| JPS58131731A | 1983-08-05 | |||
| JPS60202645A | 1985-10-14 |
Attorney, Agent or Firm:
Kenichi Hayase
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