Title:
【発明の名称】フィルタ製造工程
Document Type and Number:
Japanese Patent JP2001511486
Kind Code:
A
Abstract:
A method for producing a filter includes the steps of providing a blank of etchable semiconductor material having a first side and a second side and affixing a holding element to the blank. The holding element is chemically resistant to an etching solution. A current source is connected to the blank and at least one of the first and second sides of the blank is illuminated with light. The holding element and the blank are immersed in the etching solution until the first side of the blank is wetted so that the first side is etched electrochemically. The holding element is affixed to the blank such that contact areas between the holding element and the blank remain free of the etching solution.
Inventors:
Tsangitz Shavani
Wilfried Hoffman
Wilfried Hoffman
Application Number:
JP2000504309A
Publication Date:
August 14, 2001
Filing Date:
July 27, 1998
Export Citation:
Assignee:
Enfte/Nanofilter Tehnik/Gezels Shaft/Mitt/Peshrenktel/Haftung
International Classes:
B01J8/00; B01J8/24; B01J19/00; B01J19/12; B01D39/00; B81B1/00; C25F3/12; H01L21/3063; (IPC1-7): C25F3/12; B01D39/00; B01J19/12; H01L21/3063
Attorney, Agent or Firm:
Ryuka Akihiro