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Patent Searching and Data


Title:
METHOD FOR FORMING FILM OF HIGH-TEMPERATURE SUPERCONDUCTOR AND ITS APPARATUS
Document Type and Number:
Japanese Patent JPH0680418
Kind Code:
A
Abstract:

PURPOSE: To prevent a substrate from being deformed or damaged even in using a hardly peelable bonding medium in forming a thin film of a high- temperature superconductor and enable the peeling of a substrate from a heater block in relation to a method for forming the film of the high-temperature superconductor and its apparatus.

CONSTITUTION: The objective method for forming a film of a high-temperature superconductor is to apply a thin film 18 of the high-temperature superconductor to a substrate 10 supported by a heater block 14 and then peel the substrate 10 having the thin film of the high-temperature superconductor from the heater block 14. In this method, the substrate 10 is attached to the heater block 14 with a bonding medium 12 such as a silver paste and a material of the high- temperature superconductor is then applied to the substrate 10 to form the thin film 18. The substrate 10 having the thin film of the high-temperature superconductor is subsequently peeled from the heater block 14. In the process, a part of the heater block 14 in contact with the substrate is constructed so as to be displaced relatively to the substrate.


Inventors:
TAMURA YASUTAKA
Application Number:
JP6206092A
Publication Date:
March 22, 1994
Filing Date:
March 18, 1992
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
C01G1/00; C23C14/06; C23C14/08; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01G1/00; H01B12/06; H01B13/00; H01L39/24
Attorney, Agent or Firm:
Aoki Akira (3 outside)