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Title:
【発明の名称】積層体及びその製造方法
Document Type and Number:
Japanese Patent JP3007012
Kind Code:
B2
Abstract:
A laminate having a laminated structure of at least two layers includes a gas barrier film (A) formed from a mixture containing at least one poly(meth)acrylic acid polymer selected from the group consisting of poly(meth)acrylic acid and partially neutralized products thereof and a saccharide in a weight ratio of 95:5 to 20:80, and having an oxygen permeability constant of 5.00 x 10<-><3> ml(STP).cm/m<2>.h.atm{Pa} or smaller as measured under conditions of 30 DEG C and 80% relative humidity, and a layer (B) formed from a thermoplastic resin. The film (A) and the layer (B) are laminated contiguously to each other. A process for the production of a laminate having a laminated structure of at least two layers comprises a step of forming a gas barrier film (A) having an oxygen permeability constant of 5.00 x 10<-><3> ml(STP).cm/m<2>.h.atm{Pa} or smaller as measured under conditions of 30 DEG C and 80% RH, wherein a solution containing at least one poly(meth)acrylic acid polymer selected from the group consisting of poly(meth)acrylic acid and partially neutralized products thereof and a saccharide in a weight ratio of 95:5 to 20:80 is coated on a layer (B) formed from a thermoplastic resin, the solution coated is dried to form a film, and the film is then subjected to a heat treatment at a temperature of at least 100 DEG C (373K). The film (A) and the layer (B) are contiguous to each other.

Inventors:
Hiroyuki Ohba
Hideaki Tanaka
Tomoaki Sato
Tomohisa Hasegawa
Application Number:
JP33440594A
Publication Date:
February 07, 2000
Filing Date:
December 19, 1994
Export Citation:
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Assignee:
Kureha Chemical Industry Co., Ltd.
International Classes:
B05D3/02; B05D5/00; B05D7/04; B29C71/02; B32B27/08; B32B27/30; C08J7/048; C08L1/00; C08L1/02; C08L3/00; C08L3/02; C08L33/04; C08L33/06; B29K33/00; B29K101/12; B29L9/00; (IPC1-7): B32B27/30; B29C71/02; C08L1/02; C08L3/02; C08L33/06
Domestic Patent References:
JP51134737A
Attorney, Agent or Firm:
Shigeaki Nishikawa



 
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