Title:
【発明の名称】積層膜の作製方法
Document Type and Number:
Japanese Patent JP2647279
Kind Code:
B2
Abstract:
PURPOSE:To provide a method for producing a laminated film composed of an oxide superconductor thin film and a prescribed-shape thin film laminated on the above-mentioned oxide superconductor thin film. CONSTITUTION:A Y1Ba2Cu3O7-x thin film 1 is formed on an MgO(100) substrate 3 by the off-axis sputtering method and, after film formation, the Y1Ba2Cu3O7-x oxide superconductor thin film 1 whose surface is deteriorated by contact with the air is accommodated into an ultrahigh vacuum chamber. The chamber is then evacuated to <=1X10<-9>Torr and the Y1Ba2Cu3O7-x oxide superconductor thin film 1 is heated to 350-400 deg.C and kept for 10min. An Au thin film 2 of 200nm thickness is subsequently formed on the Y1Ba2Cu3O7-x oxide superconductor thin film 1 cleaned by the above-mentioned heat treatment using the vapor deposition method and a pattern is formed on the Au thin film 2 by photoresist 5. The Au thin film 2 and the Y1Ba2Cu3O7-x oxide superconductor thin film 1 are then processed to a prescribed shape by the reactive etching method.
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Inventors:
INADA HIROSHI
IIYAMA MICHITOMO
IIYAMA MICHITOMO
Application Number:
JP10465691A
Publication Date:
August 27, 1997
Filing Date:
April 10, 1991
Export Citation:
Assignee:
SUMITOMO DENKI KOGYO KK
International Classes:
C01B13/14; C01G1/00; C04B41/80; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01B13/14; C04B41/80; H01B13/00; H01L39/24
Attorney, Agent or Firm:
Keiko Okabe (1 person outside)