Title:
ELECTRON BEAM DRAWING DEVICE
Document Type and Number:
Japanese Patent JPH06104164
Kind Code:
A
Abstract:
PURPOSE: To realize an electron beam drawing device provided with an attraction device which is especially developed considering integrated use of wafers of different sizes as sample attraction in a vacuum sample chamber.
CONSTITUTION: An electrostatic attraction device 30 which is fixed on a stage 25 inside a vacuum sample chamber 15 and attracts a sample is an electron beam drawing device wherein an electrode layer is buried, application to an arbitrary electrode is possible and charge-up is avoided by a tube 40 enclosing an electron beam 1 as far as an area near a sample surface from a mirror tube 11. Thereby, an electron beam drawing device which can attract samples of various sizes can be acquired by the same sample attraction device.
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Inventors:
IKEDA KAZUNORI
KANNO HIROSHI
ITO HIROYUKI
KANNO HIROSHI
ITO HIROYUKI
Application Number:
JP24950992A
Publication Date:
April 15, 1994
Filing Date:
September 18, 1992
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/683; H01L21/027; H01L21/68; (IPC1-7): H01L21/027; H01L21/68
Attorney, Agent or Firm:
Ogawa Katsuo