Title:
【発明の名称】オープンフォームの製造方法
Document Type and Number:
Japanese Patent JP3423690
Kind Code:
B2
Abstract:
An open form is produced with a plurality of in each case two-dimensionally structured layers. The form is made of silicon which is etchable in dependence on its doping. A first silicon layer is first produced, and a portion of the first layer which belongs to the form to be produced, is marked by doping at least one zone of the first layer. Subsequently, at least one further silicon layer is applied, and a portion belonging to the form is also marked therein. Finally, every unmarked portion of the layers is removed by etching depending on the respective doping of each layer. The open form is, in particular, a photonic crystal.
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Inventors:
Ulrike Grunning
Hermann Went
Volker Lehmann
Reinhard Stengle
Hans Reisinger
Hermann Went
Volker Lehmann
Reinhard Stengle
Hans Reisinger
Application Number:
JP2000514317A
Publication Date:
July 07, 2003
Filing Date:
August 21, 1998
Export Citation:
Assignee:
Infineon Technologies Actien Gezel Shaft
International Classes:
G02B6/12; B32B38/10; C30B25/00; G02B1/02; G02B6/122; H01L21/306; (IPC1-7): H01L21/306; G02B1/02; G02B6/12
Domestic Patent References:
| JP5876804A | ||||
| JP7263713A | ||||
| JP5234985A |
Other References:
【文献】米国特許5600483(US,A)
【文献】国際公開97/04340(WO,A2)
【文献】国際公開92/22820(WO,A1)
【文献】国際公開97/04340(WO,A2)
【文献】国際公開92/22820(WO,A1)
Attorney, Agent or Firm:
Toshio Yano (4 outside)