PURPOSE: To obtain a developer capable of performing uniform development with high sensitivity, high resolution and a satisfactory pattern shape without leaving residue and especially effective in developing a positive type radiation sensitive resist based on a quinonediazido compd. and novolak resin after patternwise exposure with electron beams.
CONSTITUTION: This developer contains alkali metal ions, weak acid radical ions and a water-soluble org. compd. The concn. (a) of the alkali metal is 0.05-0.5mol/kg, the relations of 0.075≤bn≤1.5 and a<bn or a<bn are satisfied when the concn. of the acid radicals is represented by (b) (mol/kg) and the valence number of the weak acid radical ions is represent.ed by (n), and the concn. of the water-soluble org. compd. is 0.5-10wt.%.
KANATSUKI SHIGEYOSHI
ASANO MASAYA
