Title:
【発明の名称】ポリシリコン粉体の処理方法
Document Type and Number:
Japanese Patent JP2866878
Kind Code:
B2
Abstract:
PURPOSE:To make polysilicon powder harmless in an easy and safe manner by stabilizing the polysilicon powder by a reaction with water in the presence of a surfactant, partially dehydrating the stabilized powder and forming silica by thermal decomposition. CONSTITUTION:Flammable, explosive and poisonous polysilicon powder produced as a by-product at the time of producing an amorphous silicon film, etc., is recovered and dispersed in a large amt. of water in the presence of a surfactant such as an anionic surfactant. By this dispersion, the powder is allowed to react partially with the water to reduce the activity. The resulting stabilized powder is partially dehydrated with a filter press, etc., and thermally decomposed in the air, etc., to form silica. Since the polysilicon powder is dispersed in the large amt. of water, the heat of reaction is absorbed and a complete reaction can be attained. Since the stabilized powder having a high water content is thermally decomposed, the thermal decomposition reaction can be allowed to proceed.
Inventors:
SAITO MAKOTO
SHIMONO YOICHIRO
SHIMONO YOICHIRO
Application Number:
JP12512091A
Publication Date:
March 08, 1999
Filing Date:
April 26, 1991
Export Citation:
Assignee:
KYOSERA KK
International Classes:
C01B33/12; C01B33/18; B09B3/00; G03G5/08; (IPC1-7): C01B33/18; B09B3/00
Domestic Patent References:
| JP61245831A |
Attorney, Agent or Firm:
Akira Shioiri (1 person outside)