Title:
【発明の名称】改質多環式ポリマー
Document Type and Number:
Japanese Patent JP2002504577
Kind Code:
A
Abstract:
The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
Inventors:
Cyclomal Jayarman
George M Benedict
Larry F. Rhodes
Richard Vicari
Robert Di Allen
Richard A. Diepietro
Ratnam Soriyakumaran
Thomas Warrow
George M Benedict
Larry F. Rhodes
Richard Vicari
Robert Di Allen
Richard A. Diepietro
Ratnam Soriyakumaran
Thomas Warrow
Application Number:
JP2000532461A
Publication Date:
February 12, 2002
Filing Date:
February 19, 1999
Export Citation:
Assignee:
The B.F.Goodrich Company
INTERNATIONAL BUSINESS MASCHINES CORPORATION
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08F32/00; C08F36/00; C08G61/02; C08G61/08; G03F7/038; G03F7/004; G03F7/039; G03F7/075; (IPC1-7): C08F32/00; C08F36/00; G03F7/038; G03F7/075
Attorney, Agent or Firm:
Masataka Oshima