Title:
【発明の名称】感光性転写材料
Document Type and Number:
Japanese Patent JPH0612413
Kind Code:
B2
Abstract:
The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.
Inventors:
URURITSUHI GAISURAA
UARUTAA HERUIHI
HERUGA JIKORA
UARUTAA HERUIHI
HERUGA JIKORA
Application Number:
JP16853383A
Publication Date:
February 16, 1994
Filing Date:
September 14, 1983
Export Citation:
Assignee:
HOECHST AG
International Classes:
G03C1/76; G03C1/805; G03C11/12; G03F7/09; G03F7/004; G03F7/115; G03F7/34; (IPC1-7): G03C1/76; G03C1/805; G03F7/004; G03F7/09
Domestic Patent References:
| JP4999021A | ||||
| JP5642629A | ||||
| JP5019961B1 |
Attorney, Agent or Firm:
Toshio Yano
Next Patent: AUTOMATIC CHANNEL SELECTION STOPPING SIGNAL CIRCUIT