Title:
【発明の名称】プラズマプロセス装置
Document Type and Number:
Japanese Patent JP3384795
Kind Code:
B2
Abstract:
In a microwave plasma processing apparatus, a metal made lattice-like shower plate (111) is provided between a dielectric material shower plate (103), and a plasma excitation gas (mainly an inert gas) and a process gas are discharged from different locations. High energy ions can be incident on a surface of the substrate (114) by grounding the lattice-like shower plate. The thickness of each of the dielectric material separation wall (102) and the dielectric material at a microwave introducing part is optimized so as to maximize the plasma excitation efficiency, and, at the same time, the distance between the slot antenna (110) and the dielectric material separation wall (102) and a thickness of the dielectric material shower plate (103) are optimized so as to be capable of supplying a microwave having a large power.
Inventors:
Tadahiro Ohmi
Masaki Hirayama
Masaki Hirayama
Application Number:
JP2001500327A
Publication Date:
March 10, 2003
Filing Date:
May 25, 2000
Export Citation:
Assignee:
大見 忠弘
東京エレクトロン株式会社
東京エレクトロン株式会社
International Classes:
C23C16/24; C23C16/34; C23C16/455; C23C16/511; H01J37/32; C23C16/44; (IPC1-7): H01L21/3065; H01L21/205; H05H1/46
Domestic Patent References:
| JP9326383A | ||||
| JP6260434A | ||||
| JP11302824A | ||||
| JP8111297A | ||||
| JP8106994A |
Other References:
【文献】国際公開98/33362(WO,A1)
Attorney, Agent or Firm:
Tadahiko Ito