Title:
【発明の名称】ポリシランおよびその製造方法
Document Type and Number:
Japanese Patent JP3177683
Kind Code:
B2
Abstract:
The invention is directed to a polysilane represented by the formula (1) wherein R is hydrogen atom, alkyl group, aryl group, alkoxy group, amino group or silyl group, R's may be the same or at least two of them may be different from each other; each hydroxyl group is in the p-position or m-position; and n is 2 to 10,000. The polysilane of the invention is important as materials for modified polycarbonates or like engineering plastics, resists or electrophotographic photoreceptors.
Inventors:
Ryoichi Nishida
Hiroaki Murase
Hiroaki Murase
Application Number:
JP53073898A
Publication Date:
June 18, 2001
Filing Date:
January 07, 1998
Export Citation:
Assignee:
OSAKA GAS CO.,LTD.
International Classes:
C08G77/60; C08G63/695; C08G64/08; (IPC1-7): C08G77/60
Domestic Patent References:
| JP6256524A | ||||
| JP5271553A | ||||
| JP4363327A |
Attorney, Agent or Firm:
Eiji Saegusa (8 others)
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