Title:
FORMING METHOD OF TRANSPARENT CONDUCTIVE FILM PATTERN
Document Type and Number:
Japanese Patent JPH0772492
Kind Code:
A
Abstract:
PURPOSE: To provide a forming method of a pattern for a transparent conductive film in which etching or a metal mask is not used but a mask is formed by printing, an org. solvent is not used to remove the mask, a pattern can be formed at low cost with high accuracy, and mass production and large-size mask can be easily obtained.
CONSTITUTION: A water-soluble ink is applied by printing on the area except for the area requiring a transparent conductive film on a substrate. The ink is dried and a transparent conductive film is formed, and then the ink applied is removed with water or a liquid essentially comprised of water to obtain a transparent conductive film pattern.
Inventors:
TSUBOI MASAAKI
TAMURA SEIICHI
OOSHIMA MICHISUKE
MUNEHISA MASAKO
NOGUCHI KOICHI
TAMURA SEIICHI
OOSHIMA MICHISUKE
MUNEHISA MASAKO
NOGUCHI KOICHI
Application Number:
JP24352693A
Publication Date:
March 17, 1995
Filing Date:
September 06, 1993
Export Citation:
Assignee:
TOYO SHIGYO KK
International Classes:
G02F1/1335; G02F1/1343; (IPC1-7): G02F1/1343; G02F1/1335
Attorney, Agent or Firm:
Tadashi Hagino (3 outside)
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