Title:
【発明の名称】薄膜形成装置
Document Type and Number:
Japanese Patent JP2912842
Kind Code:
B2
Abstract:
A thin film forming device comprises a vacuum chamber which is vacuous inside, a substrate holder which is provided in the vacuum chamber for holding a substrate thereon and a molecular beam source disposed in the vacuum chamber directed toward the substrate holder. An endoscope is inserted in the vacuum chamber at the tip end thereof and is covered by a transparent protecting tube connected to the tip end of a bellows. As the bellows is stretched or retracted, the tip end portion of the endoscope and the protecting tube can be advanced to a space between the substrate held by the substrate holder and the molecular beam source or retracted into a shelter provided at a side of the space. As a result, it is possible to know the composition of a thin film as well as to observe the irradiation source of material of the thin film and the plasma radiation while the film is being formed on the film-forming surface of the substrate in the vacuum chamber.
Inventors:
TAKAHASHI HIROSHI
Application Number:
JP2354395A
Publication Date:
June 28, 1999
Filing Date:
January 17, 1995
Export Citation:
Assignee:
EIKOO ENJINIARINGU KK
International Classes:
G01N21/62; C23C14/24; C23C14/52; C30B23/02; C30B23/08; G01N21/84; G01N23/223; H01L21/203; (IPC1-7): C23C14/24; C23C14/52; G01N21/84; G01N23/223; H01L21/203
Domestic Patent References:
| JP63109168A | ||||
| JP6280014A |
Attorney, Agent or Firm:
Kazuyoshi Hojo