【発明の名称】シリコンウェーハの電解酸化のための装置

Japanese Patent JPH08507829

A

PCT No. PCT/SE94/00237 Sec. 371 Date Nov. 13, 1995 Sec. 102(e) Date Nov. 13, 1995 PCT Filed Mar. 17, 1994 PCT Pub. No. WO94/21845 PCT Pub. Date Sep. 29, 1994A device for electrolytic oxidation of silicon wafers comprises a plate-like anode (6) and a plate-like cathode (1) as well as an arrangement for holding a silicon wafer (4) between and spaced from the anode and the cathode. The anode, the cathode and the silicon wafer are horizontally arranged, and the anode and the cathode are larger than the silicon wafer. The holder arrangement consists of loose spacers (3, 5) which are provided between the silicon wafer and the respective electrode, and which enclose electrolyte, and the stack of electrodes, silicon wafer and spacers being held together only by gravity.

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Hermann Georg, Grimais
Lindblad, Andels Christer
Mandenius, Karl-Frederic Anton
Mars Otto, Parson

JP52094094A

August 20, 1996

March 17, 1994

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Hermann Georg, Grimais
Lindblad, Andels Christer
Mandenius, Karl-Frederic Anton
Mars Otto, Parson

C25D11/00; C25D11/32; C25D17/08; H01L21/31; H01L21/316; (IPC1-7): C25D17/08; C25D11/00; C25D11/32; C25D17/08; H01L21/31; H01L21/316

Kazuo Sato (3 others)

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