ELECTRON BEAM EXPOSURE SYSTEM

Title:

ELECTRON BEAM EXPOSURE SYSTEM

Document Type and Number:

Japanese Patent JPS6010723

Kind Code:

A

Abstract:

PURPOSE:To remove the influence of a magnetic field according to an eddy current, etc., and to enable to perform a stable deflection at an electron beam exposure system by a method wherein a coil to detect the output magnetic field is arranged in the neighborhood of a deflecting coil, and negative feedback is applied to a deflection amplifier to detect output thereof. CONSTITUTION:An electron beam 18 passed between electromagnetically deflecting plates 2 is electromagnetically deflected by an electromagnetically deflecting coil 8. The electromagnetically deflecting coil 8 is driven through signal lines 11, 12 by an electromagnetically deflecting circuit 9 controlled by the signal of a signal line 10 sent from a control circuit 4, and the change of a magnetic field is detected by a detecting coil 13 arranged in the neighborhood of the electromagnetically deflecting coil 8 to be fed back to the electromagnetically deflecting circuit 9 through signal lines 14, 15. Moreover a signal for correction of the magnetic field is applied to the electromagnetically deflecting circuit 9 through a signal line 16 from the control circuit 4. The electron beam 18 passed between the electromagnetically deflecting coil 8 is irradiated to the specified position of a sample 17 finally. By making the change of the output magnetic field to be fed back to the electromagnetically deflecting circuit 9, namely to the deflection amplifier in such a way, the change of the output magnetic field in relation to the change of an input voltage is stabilized and moreover quickened, and rapid scanning of the electron beam can be attained.

Inventors:

OSADA TOSHIHIKO

Application Number:

JP11908683A

Publication Date:

January 19, 1985

Filing Date:

June 30, 1983

Export Citation:

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