PURPOSE: To prevent failure of development even when a developing soln. prepared with water high in hardness is used, by developing a photosensitive material having a photopolymerizable light sensitive layer contg. an org. polymer with a developing soln. contg. a speified hardness softening agent.
CONSTITUTION: A developing soln. is obtained by dissolving in water 0.1W5wt% anionic surfactant, such as sodium lauryl alcohol sulfate; 1W5wt% org. solvent having ≤10wt% water solubility, such as 1-phenylethanol, 0.05W3wt% alkaline agent, such as NaOH, and 0.01W5wt% hard water softening agent having ≥50% sequestering rate at a pH value prescribed by the recipe of a developer to be used, such as Na2P2O7. The photosensitive material provided with a photohardenable light sensitive layer contg. an org. polymer having 10W200 acid value is imagewise exposed, and then developed with said developing soln. to remove the unexposed areas of the photosensitive layer and develop it.
MIYANO SHIZUO
HARA TETSUO
| JPS5177401A | 1976-07-05 | |||
| JPS5180228A | 1976-07-13 | |||
| JPS5525100A | 1980-02-22 | |||
| JPS4834173A | 1973-05-16 |