Title:
【発明の名称】ガラス基板乃至シリコン基板洗浄用水の製造装置
Document Type and Number:
Japanese Patent JP3324943
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an apparatus for producing electrolytically ionized water capable of producing the electrolytically ionized water which can easily wash semiconductor substrates, etc., without pollution at a low cost. SOLUTION: An aq. electrolytic soln. 2 filled in an electrolytic cell 1 is divided to an anolyte 2a and a catholyte 2b by a diaphragm 6 which consists of a porous neutral membrane and through which water can freely flow. Particularly a cathode electrode 5 of the electrodes to be used is provided with suitable holes (2 to 4 mm in diameter and the total of the areas of the holes is specified to an effective opening area of 5 to 55% of the area of the electrode plate), by which the electrolyte is made to move freely between the front and rear of the electrode and the electrolyte dissolved to a saturation concn. at the anode electrode 4 and the cathode electrode 5 is easily exchanged with the dissolved liquid of a low concn. The dissolution of the gas into the electrolyte and the generation of ions are efficiently effected and in consequence thereof the negative pole reduced water is obtd. on the cathode side.
Inventors:
Atsushi Kitada
Tadashi Kohno
Tadashi Kohno
Application Number:
JP27765396A
Publication Date:
September 17, 2002
Filing Date:
October 21, 1996
Export Citation:
Assignee:
Takio Tech Co., Ltd.
International Classes:
C25B9/17; C25B9/19; C02F1/46; (IPC1-7): C02F1/46; C25B11/03
Domestic Patent References:
| JP6260480A | ||||
| JP7263398A | ||||
| JP6277667A | ||||
| JP871560A | ||||
| JP7308672A | ||||
| JP6121978A | ||||
| JP55141597U |
Attorney, Agent or Firm:
Hatsushi Shimizu