Title:
【発明の名称】遅延回路を用いた複雑なマイクロリソグラフィ・パターンのレーザ書込み装置
Document Type and Number:
Japanese Patent JP2001520407
Kind Code:
A
Abstract:
The invention relates to a method and an apparatus for producing microlithographic patterns, in particular to the writing of photomasks for and direct writing of computer displays, microelectronic devices, and precision photoetching. It is also applicable to optical devices and a variety of electronic interconnection structures such as multichip modules. Other applications are possible, such as printing and graphics, as well as laser projection displays. More specifically the invention comprises a method and apparatus for writing of lithographic patterns with raster scanning technique comprising the use of an electronic clock to control the modulation of the beam where the placement in the scanning directions of pattern elements is controlled by time delays of at least one clock signal by fractions of a clock period where said clock period is divided into a number of preferably equally spaced delay time values by means of a delay-locked loop (DLL) and a particular delay time value is chosen according to a digital control word.
Inventors:
Sandstrom, Torbjorn
Odoserius, reif
Odoserius, reif
Application Number:
JP2000516261A
Publication Date:
October 30, 2001
Filing Date:
October 13, 1998
Export Citation:
Assignee:
Micronic Laser Systems Activora Get
International Classes:
G03F7/20; H04N1/04; H04N1/047; G03F1/08; (IPC1-7): G03F7/20; G03F1/08; H04N1/04
Attorney, Agent or Firm:
Akira Asamura (3 outside)