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Patent Searching and Data


Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JPS5831082
Kind Code:
A
Abstract:

PURPOSE: To improve the step coverege in a stepped part by specifying the angle that the line connecting targets of which the surfaces are opposed and a substrate surface to be formed with a thin film assume.

CONSTITUTION: Opposed targets 2, 3 are provided in a bell-jar 1, and a substrate holder 6 mounted with a substrate 7 is disposed in the upper part between the targets 2, 3. The distance l between the bottom end part of the holder 6 and the end part of the targets 2, 3 is set at about 10mm and the angle θ of inclination of the holder 6 at 24W45°. After the inside of the bell-jar 1 is evacuated, Argon which is a sputtering gas is introduced therein, and the pressure thereof is maintained at about 1×10-2Torr. Glow discharge is generated between the targets 2 and 3 by application of about 800V negative voltage upon the targets 2, 3, whereby the target materials are sputtered. Thus even if there is an about ≥10μ stepped part in the substrate 7, the step cutting of the film and the decrease in film thickness in the stepped part are obviated.


Inventors:
TANAKA KATSUYUKI
GOTOU NORIO
KAWANO KANJI
Application Number:
JP12780681A
Publication Date:
February 23, 1983
Filing Date:
August 17, 1981
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G11B5/31; C23C14/34; (IPC1-7): C23C15/00; G11B5/12
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)