Title:
【発明の名称】フォトレジストおよびレジストパターンの形成方法
Document Type and Number:
Japanese Patent JP2827518
Kind Code:
B2
Abstract:
A photoresist is applied on a substrate and exposed using a reduction optical system. The photoresist is adapted to have a non-linear optical effect in which the light absorption coefficient or the photochemical reaction efficiency changes non-linearly with respect to light intensity, the photoresist reacts to the second harmonic or the tertiary harmonic, or it presents a self convergence effect.
Inventors:
KURATA TETSUYUKI
HIZUKA JUJI
HIZUKA JUJI
Application Number:
JP327791A
Publication Date:
November 25, 1998
Filing Date:
January 16, 1991
Export Citation:
Assignee:
MITSUBISHI DENKI KK
International Classes:
G03F7/004; G03F7/025; G03F7/09; H01L21/027; H01L21/30; (IPC1-7): G03F7/004; G03F7/025; H01L21/027
Domestic Patent References:
| JP2183235A | ||||
| JP2173729A | ||||
| JP216559A | ||||
| JP62255475A | ||||
| JP2296245A | ||||
| JP56153338A | ||||
| JP6041650A | ||||
| JP58174941A | ||||
| JP6450043A | ||||
| JP1163735A | ||||
| JP1309051A |
Attorney, Agent or Firm:
Kaneo Miyata (2 outside)