PURPOSE: To provide the liquid crystal display device having high brightness and good display grade by forming the upper layer of a light shielding film as an oxidized insulating film.

CONSTITUTION: The upper layer part of the light shielding film 23 is anodically oxidized to form the insulating film 25, by which the insulating film 25 and its through-holes 17, 21, etc., are formed with good dimensionally accuracy without using a photolithographic stage and, therefore, the process for production is simplified and the opening rate of picture element parts is increased. The insulating film formed by the anodic oxidation method has extremely few pinholes and, therefore, the danger of the electrical contact between pixel recording mediums 27 formed on this insulating film 25 and the light shielding film 23 of the lower layer of this insulating film is decreased.