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Title:
INSULATION GATE TYPE FIELD-EFFECT TRANSISTOR
Document Type and Number:
Japanese Patent JPS5842275
Kind Code:
A
Abstract:

PURPOSE: To reduce the resistance when ON position is given as well as to reduce power consumption for the titled resistor by a method wherein a conductor layer to be used as an ohmic contacting current circuit is provided on the surface of the high specific resistance drain region of the MOSFET whereon the high specific resistance drain region is provided on the channel side.

CONSTITUTION: An n- type layer 2 of high specific resistance is provided on an n+ type substrate 1, a p type region 6 is formed thereon, an n+ type region 8 to be turned to a source region is provided in the region 6, and then a gate electrode 11 is formed on the surface 9 of the remaining p type region which will be used as a channel region through the intermediary of an insulating layer 10. Also, an n+ type region 5 is provided on the surface of an n- type layer 2 as a low resistance drain region, and a conductor layer 41 is provided as an ohmic- contacting current circuit on the surface of a high specific resistance drain region 7 located between a channel region 9 and a low resistance drain region 5. As a result, the series resistance between a source and a drain is reduced by the action of a conductor layer 41, thereby enabling to cut down the power consumption of the titled transistor.


Inventors:
SAKAI TATSUROU
KATOU KUNIHARU
SHIMADA YUUKI
KURODA IWAO
YOSHIDA HIROSHI
Application Number:
JP14080381A
Publication Date:
March 11, 1983
Filing Date:
September 07, 1981
Export Citation:
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Assignee:
NIPPON TELEGRAPH & TELEPHONE
NIPPON ELECTRIC CO
International Classes:
H01L29/78; H01L29/06; H01L29/41; H01L29/417; (IPC1-7): H01L29/78
Domestic Patent References:
JPS4915911A1974-02-12
Attorney, Agent or Firm:
Shoji Tanaka



 
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