Title:
SAMPLE HOLDER FOR ION IMPLANTATION
Document Type and Number:
Japanese Patent JPS5961043
Kind Code:
A
Abstract:
PURPOSE:To prevent the contamination of a sample at the time of ion implantation by a method wherein a part irradiated with ions is coated with a specific compound, in sample holder for ion implantation. CONSTITUTION:In the sample holder 31 wherein a recess to hold the sample 13 has been formed, a coating material 33 is formed in the periphery of the substrate except the recess. This coating material 33 is composed of the same element as the sample 13, or of the compound of this element with the element gassified at the time of dissociation by ion irradiation. By such a constitution, the sample holder 31 receives the ion irradiation, and accordingly the contamination of the sample 13 due to the sputter 34 generated therefrom can be prevented.
Inventors:
IGAWA EIJI
KUROKI YUKINORI
KUROKI YUKINORI
Application Number:
JP17073182A
Publication Date:
April 07, 1984
Filing Date:
September 29, 1982
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01J37/317; H01J37/00; H01L21/265; H01L21/683; (IPC1-7): H01J37/00; H01L21/265
Attorney, Agent or Firm:
Uchihara Shin
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