PURPOSE: To enable transfer of high-precision pattern without disturbing an exposure optical system in fixing a photomask to a prescribed exposure device, by adjusting the distance between a light intercepting pattern and a light transmitting plate to set the optical light path length difference of exposure light to a prescribed value.
CONSTITUTION: A light transmitting plate 1 has a light intercepting pattern 2 on the surface, and the surface of the pattern 2 is covered with the second light transmitting plate 3. The space between both plates 1, 3 is filled with a light transmitting liquid adhesive 4 and fixed by hardening it, thus permitting no dust to attach to the pattern 2. The optical path length difference of the exposure light is adjusted to a predetermined value by regulating the distance (h) between the pattern 2 and the reverse face of the plate 3.
KUROSAKI TOSHISHIGE
KUNIYOSHI SHINJI
TAKANASHI AKIHIRO
TERASAWA TSUNEO
HOSAKA SUMIO
