Title:
ELECTRON BEAM ANNEALING DEVICE
Document Type and Number:
Japanese Patent JPS605513
Kind Code:
A
Abstract:
PURPOSE:To enable to perform a uniform heat treatment even when the temperature of a sample rises while an electron beam is being scanned by a method wherein a function, with which the scanning speed of an electron beam will be increased as time elapses, is added to the titled device. CONSTITUTION:Every time when a scanning is finished for one step in x-axis direction, the coincidence signal COMX outputted from a comparison circuit 23 is sent to the central processing device 1, and a signal FD to be used to increase the frequency of a clock signal CLOCK is sent to a clock generation circuit 17 from the central processing device 1. As a result, every time when the scanning for a step in x-axis direction is finished, the counting speed of a counter 18 is increased, and the boosting speed of the voltage XD applied to the deflector in x-axis direction is increased, thereby enabling to increase the scanning speed in x-axis direction. Also, the irradiation dose on the specific region of the electron beam per unit time is reduced with the increase of the scanning speed in x-axis direction as time elapses even when there generates the necessity of reduction in irradiation dose of the electron beam when the temperature of the sample is gradually increased due to the heat-storage effect of the sample.
Inventors:
TSUCHIKAWA HARUO
Application Number:
JP11320783A
Publication Date:
January 12, 1985
Filing Date:
June 23, 1983
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01J37/26; H01L21/20; H01L21/26; H01L21/263; (IPC1-7): H01L21/26; H01J37/26; H01L21/20; H01L21/324
Attorney, Agent or Firm:
Koshiro Matsuoka
Next Patent: JPS605514