PURPOSE: To heighten the productivity of face panels by a method, in which a phosphor layer and a film layer are formed on the inside of the face panel followed by maintaining the face panel inside in a gas atmosphere of a specific vacuum degree and performing sputtering for simultaneously fomring a luminous reflective metal film and a thermoabsorbing material film on the film layer.
CONSTITUTION: Sputtering maintains the inside of a face panel 1 in a gas atmosphere of a vacuum degree 10-4W10-2Torr while being performed with a luminous reflective metal as a target. Generally, a mixture gas of rare gas such as helium, neon, argon, krypton and xenon and a nitric compound such as nitorgen, ammonia and dicyan or a compound separating and generating nitrogen under said sputtering atmosphere is used as the atmosphere gas. The kind of the atmospheric gas is properly selected according to a sputtering condition, however, desirably a mixture gas of nitrogen gas and rare gas, which are cheap and easy to handle, is used while more desirably mixture gas consisting of 3W10vol% of nitrogen and 90W97vol% of rare gas is used. Sputtering is desirably performed until the sputtering film thickness reaches 500W5,000.
SHINOZAKI KAZUO
KATOU ATSUSHI
