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Title:
ELECTROPHOTOGRAPHIC SENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPS60115940
Kind Code:
A
Abstract:

PURPOSE: To increase dark resistance and to improve simultaneously the mechanical characteristics, heat resistance, and photosensitivity by forming a P type a-Si film doped with boron on an electroconductive substrate and laminating an a-SiC film doped with C thereon.

CONSTITUTION: A P type a-Si film 2 doped with boron is formed on an electroconductive substrate 1 and an a-SiC film 3 doped with C and an undoped a-Si film are further successively laminated thereon. For example, a photosensitive body may be formed by providing further a layer doped with C on said undoped a-Si film. By the lamination of a P type a-Si film 1 on an a-SiC film, similar effect on the PN junction of a semiconductor is obtd., reducing dark attenuation after stopping corona discharge, and a distinct picture image is formed due to elongation of half-potential level period. The mechanical strength, heat resistance, and photosensitivity are improved by doping the outermost layer with carbon, and the durability is also improved.


Inventors:
HATAKE YASUHIKO
SANO SEIJIROU
MATSUDA HIROSHI
Application Number:
JP22225483A
Publication Date:
June 22, 1985
Filing Date:
November 28, 1983
Export Citation:
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Assignee:
KOMATSU MFG CO LTD
International Classes:
G03G5/08; G03G5/14; (IPC1-7): G03G5/14
Attorney, Agent or Firm:
Yonehara Masaaki



 
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