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Title:
RESIN COMPOSITION FOR AQUEOUS DISPERSION
Document Type and Number:
Japanese Patent JPS59126418
Kind Code:
A
Abstract:

PURPOSE: The titled composition that is obtained by irradiating a mixture of a specific saturated polymer insoluble in water and a specific quaternary salt with electron rays, thus having fine particle sizes and giving aqueous dispersion with high water and solvent resistances, good physical properties and chemical stability.

CONSTITUTION: A mixture consisting of (A) 85W98wt% of a saturated polymer resulting from addition or condensation reaction between (i) an organic compound bearing alcoholic or phenolic hydroxyls and (ii) another organic compound bearing groups selected from carboxyl, isocyanate and aldehyde, such as a saturated polyester resin obtained from a saturated dihydric alcohol and a saturated dibasic acid and (B) 2W15wt% of an α,β-unsaturated carboxyl-containing quaternary salt having one amine nitrogen atom which can be converted into the quaternary form in the ester residue such as methacryloyloxyethyl triethyl ammonium chloride is irradiated with electron rays to give the objective composition.


Inventors:
HOSOI FUMIO
SASAKI TAKASHI
HAGIWARA MIYUKI
NANISHI YASUSHI
Application Number:
JP15027082A
Publication Date:
July 21, 1984
Filing Date:
August 30, 1982
Export Citation:
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Assignee:
JAPAN ATOMIC ENERGY RES INST
International Classes:
C08F2/00; C08F2/54; C08F283/00; (IPC1-7): C08F2/54; C08F283/00
Domestic Patent References:
JPS5462294A1979-05-19
Attorney, Agent or Firm:
Kyozo Yuasa