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Patent Searching and Data


Title:
ACTIVATING METHOD FOR ELECTROLESS COPPER PLATING
Document Type and Number:
Japanese Patent JPS6036674
Kind Code:
A
Abstract:

PURPOSE: To improve the characteristics of electroless copper plating by immersing an article to be plated in an aqueous soln. contg. a complex compound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with glucose, pulling up the article, and heating it to produce metallic Pd or Cu.

CONSTITUTION: An article to be plated is immersed in an aqueous soln. of a complex compound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with glucose. The concn. of the complex compound in the aqueous soln. is ≤1wt% when the compound is expressed in terms of Pd or Cu. The article is pulled up from the soln., and it is heated to 30W200°C to form metallic Pd or Cu particles on the surface of the article. The article is then subjected to electroless copper plating by a conventional method.


Inventors:
MATSUZAKI ISAO
YOKONO HARUKI
ISHIBASHI TAKEHIKO
Application Number:
JP14464083A
Publication Date:
February 25, 1985
Filing Date:
August 08, 1983
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C23C18/30; C23C18/28; C23C18/40; (IPC1-7): C23C18/30
Attorney, Agent or Firm:
Kunihiko Wakabayashi